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CHA MARK 40
    Description
    No description
    Configuration
    CHA Mark 40 LH PC/PLC Plasma Enhanced Chemical Vapor Deposition – Vacuum Evaporator: 8.25 gpm; 90-100 psi – 208V – 60Hz – 3 Phase – 125 Amps
    OEM Model Description
    The CHA MARK 40 is a highly efficient and flexible vacuum deposition system that supports dual operation, including sputtering and evaporation processes. It is designed to handle moving substrates, allowing for continuous and precise deposition of thin films on various materials. The system offers exceptional film uniformity, although the results may depend on the specific fixture used.
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    CHA

    MARK 40

    verified-listing-icon

    Verified

    CATEGORY

    Thermal Evaporators
    Last Verified: Over 30 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    85080


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown

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    CHA MARK 40
    CHAMARK 40Thermal Evaporators
    Vintage: 0Condition: Used
    Last Verified24 days ago

    CHA

    MARK 40

    verified-listing-icon

    Verified

    CATEGORY

    Thermal Evaporators
    Last Verified: Over 30 days ago
    listing-photo-b4964dd0732b4591a7f5af2fbd4b7e37-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2046/b4964dd0732b4591a7f5af2fbd4b7e37/3b076f38048d4e4f9bc5d22857ea5a66_9b73d2ec64444b83ad6e08693ceeade845005c_mw.jpeg
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    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    85080


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    CHA Mark 40 LH PC/PLC Plasma Enhanced Chemical Vapor Deposition – Vacuum Evaporator: 8.25 gpm; 90-100 psi – 208V – 60Hz – 3 Phase – 125 Amps
    OEM Model Description
    The CHA MARK 40 is a highly efficient and flexible vacuum deposition system that supports dual operation, including sputtering and evaporation processes. It is designed to handle moving substrates, allowing for continuous and precise deposition of thin films on various materials. The system offers exceptional film uniformity, although the results may depend on the specific fixture used.
    Documents

    No documents

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