Description

Working condition, no known issues

Configuration

• Windows Based Operator Workstation • Drawer in Front (B) Base Configuration • Robotic Loader • PATMAX MVS Alignment System • Step Specific Processing Mode Software • 30 x 15 mm Field Size - Manual Aperture • 6-inSubstrates • 3 X 5 Inch Reticles • Lens Distortion Reference - No Lens Matching • 115V Power Source • Four Color Signal Light Tower • Single Probe Focus Software • Focus Mapping (Grid Focus) Software • MVS Manual Alignment Software • Topside EGA Software * Wafer Thickness Compensator (4 mm Max Thickness)

OEM Model Description

The Sapphire 100 is also based on the 1000 Series platform, with additional features developed specifically for HBLED lithography applications. HBLED manufacturing requires special substrate handling capabilities for the small diameter sapphire and silicon carbide substrates used to manufacture the LED devices for display backlighting and general lighting applications. For HBLED applications, we believe our Sapphire 100 stepper offers depth of focus, productivity and yield improvement advantages over competitive product offerings.