Semiconductors control a host of functions in electronic equipment. Nikon offers a stellar lineup of cutting-edge lithography systems that support precision circuit design down to the nanometer level.

NIKON

NSR-SF130, a scan-field i-line stepper with high throughput and extremely low cost of ownership. The system makes use of leading-edge lens technology to achieve the same wide exposure field (26×33 mm) as DUV scanners, making it ideal for mix and match applications. The NSR-SF130, Nikon’s fifth new semiconductor systems announced in 2003, achieves a resolution of 280 nm or better and boasts a throughput of 120 wafers/hour for 300 mm wafers. The system combines superior performance with the lowest cost of ownership to help reduce semiconductor manufacturing costs.

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NIKON

NSR-SF130

Steppers & Scanners

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NSR-SF130

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NSR-SF130

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NSR-SF130

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NSR-SF130

NIKON

NSR-SF130

NIKON

NSR-SF130

NIKON

NSR-SF130

NSR-SF130

Steppers & Scanners

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NIKON

NSR-SF130

NIKON

NSR-SF130

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NSR-SF130

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NSR-SF130

NIKON

NSR-SF130

NIKON

NSR-SF130

NIKON

NSR-SF130

NIKON

NSR-SF130