Description
Nikon Arf lithography machine uses 193nm wavelength ArF excimer laser for exposure, which is suitable for advanced semiconductor manufacturing processes. It can support the current mainstream 12-inch wafer production, and is also suitable for the production of 8-inch wafers. It can achieve smaller feature sizes and plays a vital role in improving chip performance and integration. It provides semiconductor manufacturers with high-precision and high-production efficiency solutions.Configuration
Scanning 0.07 0.92 4:1 26*33 12OEM Model Description
NSR-S308F (resolution ≦ 65 nm). The NSR-308F has a newly developed platform that enables dramatic improvements in alignment accuracy and throughput. Alignment accuracy has been reduced to 8 nm or less, a 44% improvement over Nikon’s previous generation ArF scanner, while throughput was increased to 140 wafers or more per hour for 300 mm wafers, an improvement of approximately 25%. With this significant increase in productivity, the system delivers next-generation process capabilities at a lower overall cost of ownership.Documents
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NIKON
NSR-S308F
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131677
Wafer Sizes:
8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Nikon Arf lithography machine uses 193nm wavelength ArF excimer laser for exposure, which is suitable for advanced semiconductor manufacturing processes. It can support the current mainstream 12-inch wafer production, and is also suitable for the production of 8-inch wafers. It can achieve smaller feature sizes and plays a vital role in improving chip performance and integration. It provides semiconductor manufacturers with high-precision and high-production efficiency solutions.Configuration
Scanning 0.07 0.92 4:1 26*33 12OEM Model Description
NSR-S308F (resolution ≦ 65 nm). The NSR-308F has a newly developed platform that enables dramatic improvements in alignment accuracy and throughput. Alignment accuracy has been reduced to 8 nm or less, a 44% improvement over Nikon’s previous generation ArF scanner, while throughput was increased to 140 wafers or more per hour for 300 mm wafers, an improvement of approximately 25%. With this significant increase in productivity, the system delivers next-generation process capabilities at a lower overall cost of ownership.Documents
No documents