
Description
Lithography Step and repeat scanning system Fab Section - LithographyConfiguration
Software Version - 1.80 MCSW+OCS CIM - SECS Process - Exposure Wafers ( 248nm ) KrFOEM Model Description
NSR-S208D (resolution ≦ 110 nm).Documents
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NSR-S208D
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131887
Wafer Sizes:
Unknown
Vintage:
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available