Description
System Issues: 1.Reticle stage leakage 2.PLC temp abnormal Cymer XLA 130 laser 2.Cymer chamber(MO/PA) damagedConfiguration
ArF scanner (4X) Includes a Canon FPA-60000AS4 main body, Cymer laser, and chiller.OEM Model Description
The FPA-6000AS4 is an ArF scanner that is the industry’s fastest and has the highest NA (0.85). It can project features as small as 85nm and is built on Canon’s new 140-wph, F2-capable FPA-6000 single-stage platform. It provides a cost-optimized solution for high volume 300mm or 200mm exposure processes for leading-edge device manufacturers choosing a mix-and-match strategy. The scanner has a 0.85-NA, 4:1 reduction lens system and is capable of 85-nanometer resolution with an overlay precision of 18nm.Documents
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CANON
FPA-6000AS4
Verified
CATEGORY
Steppers & Scanners
Last Verified: 12 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Idle
Product ID:
115820
Wafer Sizes:
Unknown
Vintage:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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CANON
FPA-6000AS4
CATEGORY
Steppers & Scanners
Last Verified: 12 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Idle
Product ID:
115820
Wafer Sizes:
Unknown
Vintage:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
System Issues: 1.Reticle stage leakage 2.PLC temp abnormal Cymer XLA 130 laser 2.Cymer chamber(MO/PA) damagedConfiguration
ArF scanner (4X) Includes a Canon FPA-60000AS4 main body, Cymer laser, and chiller.OEM Model Description
The FPA-6000AS4 is an ArF scanner that is the industry’s fastest and has the highest NA (0.85). It can project features as small as 85nm and is built on Canon’s new 140-wph, F2-capable FPA-6000 single-stage platform. It provides a cost-optimized solution for high volume 300mm or 200mm exposure processes for leading-edge device manufacturers choosing a mix-and-match strategy. The scanner has a 0.85-NA, 4:1 reduction lens system and is capable of 85-nanometer resolution with an overlay precision of 18nm.Documents
No documents