Description
Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.Configuration
0.35 0.45-0.57 4:1 26*33 30OEM Model Description
The FPA-5510iZ is a high throughput 4X i-line stepper with a CoO advantage for exposing layers down to 280nm. It is compatible with both 200mm and 300mm DUV scanners. Features include improved overlay and throughput performance through Canon's step-and-repeat know-how, reduced overlay accuracy to 20nm, enhanced focus and tilt compensation accuracy, temperature control, and auto-calibration functions. It also has a 4.5kW high-pressure Mercury Lamp, high transmittance optical system, dynamic aberration correction, fast wafer stage, and optimized wafer handling system for sustained high productivity (160wph for 200mm wafers and 100wph for 300mm wafers).Documents
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Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131685
Wafer Sizes:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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CANON
FPA-5510iZ
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131685
Wafer Sizes:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.Configuration
0.35 0.45-0.57 4:1 26*33 30OEM Model Description
The FPA-5510iZ is a high throughput 4X i-line stepper with a CoO advantage for exposing layers down to 280nm. It is compatible with both 200mm and 300mm DUV scanners. Features include improved overlay and throughput performance through Canon's step-and-repeat know-how, reduced overlay accuracy to 20nm, enhanced focus and tilt compensation accuracy, temperature control, and auto-calibration functions. It also has a 4.5kW high-pressure Mercury Lamp, high transmittance optical system, dynamic aberration correction, fast wafer stage, and optimized wafer handling system for sustained high productivity (160wph for 200mm wafers and 100wph for 300mm wafers).Documents
No documents