Description
i-Line Wide-Field StepperConfiguration
No ConfigurationOEM Model Description
The FPA-5510iZ is a high throughput 4X i-line stepper with a CoO advantage for exposing layers down to 280nm. It is compatible with both 200mm and 300mm DUV scanners. Features include improved overlay and throughput performance through Canon's step-and-repeat know-how, reduced overlay accuracy to 20nm, enhanced focus and tilt compensation accuracy, temperature control, and auto-calibration functions. It also has a 4.5kW high-pressure Mercury Lamp, high transmittance optical system, dynamic aberration correction, fast wafer stage, and optimized wafer handling system for sustained high productivity (160wph for 200mm wafers and 100wph for 300mm wafers).Documents
No documents
CANON
FPA-5510iZ
Verified
CATEGORY
Steppers & Scanners
Last Verified: 19 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116236
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CANON
FPA-5510iZ
CATEGORY
Steppers & Scanners
Last Verified: 19 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116236
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
i-Line Wide-Field StepperConfiguration
No ConfigurationOEM Model Description
The FPA-5510iZ is a high throughput 4X i-line stepper with a CoO advantage for exposing layers down to 280nm. It is compatible with both 200mm and 300mm DUV scanners. Features include improved overlay and throughput performance through Canon's step-and-repeat know-how, reduced overlay accuracy to 20nm, enhanced focus and tilt compensation accuracy, temperature control, and auto-calibration functions. It also has a 4.5kW high-pressure Mercury Lamp, high transmittance optical system, dynamic aberration correction, fast wafer stage, and optimized wafer handling system for sustained high productivity (160wph for 200mm wafers and 100wph for 300mm wafers).Documents
No documents