Description
Canon KrF lithography machine uses a 248nm wavelength KrF excimer laser as the exposure light source. It is suitable for more sophisticated semiconductor processes and is widely used in the manufacture of high-performance semiconductor devices. It has better alignment accuracy and plays an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.Configuration
0.18 0.50~0.80 4:1 26*33 25OEM Model Description
The CANON FPA 5000 ES4 scanner is geared for both 200mm and 300mm wafer fabs. This lithography system is suitable for applications at the 100-nm (0.10-micron) and below. The FPA 5000-ES4 has high-throughput rates of 110 wafers per hour (wph) on 300mm and 160wph on 200mm. The s an expansion of Canon's high NA, 248-nm tools for mix-and-match applicationsDocuments
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Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131689
Wafer Sizes:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CANON
FPA-5000ES4
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131689
Wafer Sizes:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Canon KrF lithography machine uses a 248nm wavelength KrF excimer laser as the exposure light source. It is suitable for more sophisticated semiconductor processes and is widely used in the manufacture of high-performance semiconductor devices. It has better alignment accuracy and plays an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.Configuration
0.18 0.50~0.80 4:1 26*33 25OEM Model Description
The CANON FPA 5000 ES4 scanner is geared for both 200mm and 300mm wafer fabs. This lithography system is suitable for applications at the 100-nm (0.10-micron) and below. The FPA 5000-ES4 has high-throughput rates of 110 wafers per hour (wph) on 300mm and 160wph on 200mm. The s an expansion of Canon's high NA, 248-nm tools for mix-and-match applicationsDocuments
No documents