Description
Canon KrF lithography machine uses a 248nm wavelength KrF excimer laser as the exposure light source. It is suitable for more sophisticated semiconductor processes and is widely used in the manufacture of high-performance semiconductor devices. It has better alignment accuracy and plays an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.Configuration
0.18 0.50~0.65 5:1 22*22 35OEM Model Description
The FPA-3000EX6 features the first stepper lens that is specifically designed for use with Canon's new IDEAL resolution enhancement technique. IDEAL multilevel imaging is Canon's new method for achieving a process k1 factor of 0.3 with ordinary optical lithography tools. Using IDEAL, the EX6 can image circuit features below 120nm with good process latitude. While IDEAL enables optical lithography to resolve circuit patterns smaller than one-half the wavelength of the illumination light, it also requires a lens with an extremely low wavefront aberration.Documents
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Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131687
Wafer Sizes:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CANON
FPA-3000EX6
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131687
Wafer Sizes:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Canon KrF lithography machine uses a 248nm wavelength KrF excimer laser as the exposure light source. It is suitable for more sophisticated semiconductor processes and is widely used in the manufacture of high-performance semiconductor devices. It has better alignment accuracy and plays an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.Configuration
0.18 0.50~0.65 5:1 22*22 35OEM Model Description
The FPA-3000EX6 features the first stepper lens that is specifically designed for use with Canon's new IDEAL resolution enhancement technique. IDEAL multilevel imaging is Canon's new method for achieving a process k1 factor of 0.3 with ordinary optical lithography tools. Using IDEAL, the EX6 can image circuit features below 120nm with good process latitude. While IDEAL enables optical lithography to resolve circuit patterns smaller than one-half the wavelength of the illumination light, it also requires a lens with an extremely low wavefront aberration.Documents
No documents