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ASML PAS 5500/750F

Description

PLXM20 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -

Configuration

No Configuration

OEM Model Description

DUV Step and Scan The PAS 5500/750F DUV Step-and-Scan system enables 130-nm mass production using mature 248-nm KrF technology. It combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest multi-spot innovations in the leveling system and the AERIAL II illumination technology including QUASAR, multipole illumination and optional multiple exposure capability. The system is equipped with both TTL alignment and ATHENA for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 25 nm.

Documents

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ASML

PAS 5500/750F

verified-listing-icon

Verified

CATEGORY

Steppers & Scanners

Last Verified: 12 days ago

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

149301

Wafer Sizes:

Unknown

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

Similar Listings

ASML PAS 5500/750F

ASML

PAS 5500/750F

Steppers & Scanners

Vintage: 0Condition: Used

Last Verified12 days ago

ASML

PAS 5500/750F

verified-listing-icon

Verified

CATEGORY

Steppers & Scanners

Last Verified: 12 days ago

listing-photo-4cd51698e3bb4e0e9cf88646ef1f8dad-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

149301

Wafer Sizes:

Unknown

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

Description

PLXM20 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -

Configuration

No Configuration

OEM Model Description

DUV Step and Scan The PAS 5500/750F DUV Step-and-Scan system enables 130-nm mass production using mature 248-nm KrF technology. It combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest multi-spot innovations in the leveling system and the AERIAL II illumination technology including QUASAR, multipole illumination and optional multiple exposure capability. The system is equipped with both TTL alignment and ATHENA for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 25 nm.

Documents

No documents

Similar Listings

ASML PAS 5500/750F

ASML

PAS 5500/750F

Steppers & ScannersVintage: 0Condition: UsedLast Verified:12 days ago