Description

No missing, with HDD Process: 193nm immersion lithography for 38nm resolution capability

Configuration

Resolution: 38nm Overlay: 4 nm SMO 7 nm MMO Laser Power: 60W Throughput: 300mm wafers - 148wph - (125 exp 30 mJ) Key Specifications 1. Resolution: 38nm Overlay: 4nm SMO / 7nm MMO 2. Throughput: 148wph (300mm with 125 exposures at 30 mJ) 3. Received & In-Service Sep/2010 Model # XT:1950Hi (300mm) Projection Lens 4. ZEISS Starlith 1950 with max NA of 1.35 or equivalent Illumination System 5. AERIAL XP Illumination System – P-Type Illuminator Alignment — Blue Align with Athena Narrow Marks Leveling 6. Focus and Field-by-Field Leveling Reticle Management 7.2 Load Ports Laser 8. CYMER XLR-560i 193nm 60W/6khz Laser with E95 bandwidth monitoring Environment 9. Class 1 Environment with Semi compliant MENV and FIMS assemblies Controls 10. UNIX/SUN Architecture Standard Capabilities – Focus Spot Monitoring – Circuit Dependant Focus Edge Clearance – CD-FEC – Dual E-Chucks (bonded SiSiC) – Image Streaming – Lot Streaming and LS-MATCH2 (XT) – Lot Overhead Reduction 1 and 2 – Productivity Enhancement Package PEP XT:1950Hi – In-situ Metrology (ILIAS software and sensor module) – LithoGuide ILIAS (SAMOS and PUPICOM) – UNICOM XT – DoseMapper ArF – QUASAR XL (15 slot) – Reticle Shape Correction – 2DE Grid Calibration – TWINSCAN Overlay Package TOP XT:1950Hi Additional Options – WATER COOLING FOR ELECTRONICS CABINET – CUSTOMIZED ILLUMINATION – multiple DOEs – Integrated Reticle Libary IRL-XP for H-SPEC systems – Integrated Reticle Inspection System IRIS-XT – Reticle Streaming – SpotLess G & H – GridMapper TWINSCAN – FSM Flex Package for TWINSCAN – Aux Port 300mm FOUP/25 Wafer – SMASH XY Reticles – -40nm Defect – -Single Lot Tst Overlay Support Equipment – Power Conditioner – 135 kVA Power Conditioning and Distribution Unit. TEAL model number PCDU-XT1900 – XCDA Gas Purification System Backup Purifier Canister: Optics Series, 10 MH, SS – XCDA Gas Purification System Bypass Manifold: Manifold Three Valve 10M – Filter Housing – Cabinet, ESI VaporSorb EX2600 and Filter Set Standards and Compliance – CE marked S2 Compliant Manuals

OEM Model Description

The XT:19x0 series includes the XT:1900Gi and XT:1950Hi systems, both featuring the industry’s largest numerical aperture of 1.35. In total, ASML has shipped more than 160 TWINSCAN immersion systems, all capable of imaging sub-60 nm chip features.