Description
Asset Description - 193nm Immersion scanner Software Version - 5.1 CIM - secs Process - 40/45nmConfiguration
ASML XT1900Gi TEL Lithius Pro IOEM Model Description
The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.Documents
Verified
CATEGORY
Steppers & Scanners
Last Verified: 7 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
146139
Wafer Sizes:
12"/300mm
Vintage:
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ASML
TWINSCAN XT:1900Gi
CATEGORY
Steppers & Scanners
Last Verified: 7 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
146139
Wafer Sizes:
12"/300mm
Vintage:
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available