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ASML TWINSCAN XT:1900Gi
    Description
    (1) Main System (1) CYMER laser (1) MCWC (1) main body (1) WISR (1) WICR (1) Filter cabinet (1) LCWC (1) ACC
    Configuration
    The cymer laser is EOL. -193nm ASML Immersion scanner -SW Version: 5.1 -SECS -40/45nm backend
    OEM Model Description
    The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.
    Documents
    CATEGORY
    Steppers & Scanners

    Last Verified: Over 30 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    105053


    Wafer Sizes:

    12"/300mm


    Vintage:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    ASML

    TWINSCAN XT:1900Gi

    verified-listing-icon
    Verified
    CATEGORY
    Steppers & Scanners
    Last Verified: Over 30 days ago
    listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/13ac333a987642f4a4bdd6b44b0bb473_c302b0aabbe6472a98bb87646ecc0f391201a_mw.jpeg
    listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/5fa191f9d0224d35b23636871bd01b11_cd74f47b816b43ef91be208953c707751201a_mw.jpeg
    listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/9318b64de9dd4003a5b73d45f8059a2a_8a6ef44367664167aecd28db89accd6f1201a_mw.jpeg
    listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/fae93219e83a412a988bef863f46a6ef_b5b3e2ddf3874ea5b3658d809d31e49e1201a_mw.jpeg
    listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/2e9bc82132514f44b1c9d2616be13792_44853d704610440ab58a5ec8d69fd22f1201a_mw.jpeg
    listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/80af2d6360614e7d90bb70ca216ce786_8c8e5cc6278e4ceb9328b644c96fc551_mw.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    105053


    Wafer Sizes:

    12"/300mm


    Vintage:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    (1) Main System (1) CYMER laser (1) MCWC (1) main body (1) WISR (1) WICR (1) Filter cabinet (1) LCWC (1) ACC
    Configuration
    The cymer laser is EOL. -193nm ASML Immersion scanner -SW Version: 5.1 -SECS -40/45nm backend
    OEM Model Description
    The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.
    Documents