Description

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Configuration

ASML TWINSCAN XT:1400F 193nm (ArF) Scanner Lithography Equipment Equipment details: Currently Configured for: 300mm Current Equipment Status: Available Asset HDD not included • Cymer XLA-165 45 W. 4kHz laser • 4 FOUP Loadports • Projection Lens The Starlith Aerial E illumination system Quasar illumination module Beam Delivery syst • Alignment System o Wafer alignment using ATHENA o Reticle BLUE alignment o ATHENA narrow marks o TOP 1 and TOP 2 • Lot streaming Scanning stages Wafer handling Exposure chucks Lot overhead reduction • Focus control and field by field leveling Focus Spot Monitoring CD-FEDC LS MATCH2 • Reticle shape correction • System calibration and image quality control in-situ metrology (ILIAS SAMOS) Lithoguide Pupicom Dos • UNIX/SUN Architecture for user interface • Reticle management reticle error compensation • DOE Low Sigma 193 • Aux Port 300mm FOUP/25 wafer • IRIS for Twinscan 6 Inch • Integrated reticle library

OEM Model Description

The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.