Description
No descriptionConfiguration
Asset Description: ASML KrF Twinscan Software Version: 5.1 CIM: SECS/GEM Process: 12LP Main System: Main Tool Body (1) Handler System: TEL TRK interface (1) Factory Interface: FOUP (2)OEM Model Description
The TWINSCAN XT:1060K is ASML’s most advanced KrF (krypton fluoride) laser ‘dry’ lithography system. The TWINSCAN XT:1060K 248 nm step-and-scan system is a dual-stage lithography tool with the highest NA and productivity in the industry, designed for 300 mm wafer production. Extending critical KrF technology reduces our customers' cost per layer while allowing them to benefit from mature KrF processing.Documents
No documents
Verified
CATEGORY
Steppers & Scanners
Last Verified: 25 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
138151
Wafer Sizes:
12"/300mm
Vintage:
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN XT:1060K
CATEGORY
Steppers & Scanners
Last Verified: 25 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
138151
Wafer Sizes:
12"/300mm
Vintage:
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Asset Description: ASML KrF Twinscan Software Version: 5.1 CIM: SECS/GEM Process: 12LP Main System: Main Tool Body (1) Handler System: TEL TRK interface (1) Factory Interface: FOUP (2)OEM Model Description
The TWINSCAN XT:1060K is ASML’s most advanced KrF (krypton fluoride) laser ‘dry’ lithography system. The TWINSCAN XT:1060K 248 nm step-and-scan system is a dual-stage lithography tool with the highest NA and productivity in the industry, designed for 300 mm wafer production. Extending critical KrF technology reduces our customers' cost per layer while allowing them to benefit from mature KrF processing.Documents
No documents