Description

Immersion Scanner

Configuration

· Track Interface: TEL Lithius · CYMER XLR-660 193nm, 60W, 6khz Laser Source · 1.35NA Catadioptric Projection Lens with 4x Reduction · Aerial XP Polarized illuminator · Quasar XL illumination module · Next Generation Magnetically Levitated Dual-Stage Technology delivering <2.5nm (chuck dedicated) single machine overlay · Alignment System: o SMASH NXT Alignment System · Advanced Lens Control X/Y · Image Tuner · Focus Spot monitoring · Polarization Control · CD-FEC · LS MATCH2 · Reticle System: o Reticle error compensation o Reticle shape correction o Reticle management and E-connectivity support · In-situ metrology (ILIAS) · LITHOGUIDE ILIAS · DOSEMAPPER · Athena Narrow Marks · Inform (SECS) · User interface UNIX/SUN Architecture Other Features: · Azimuthal Polarization · AUX Port 300mm FOUP/25 Wafer · FOUP Lock-out system · Universal Pre-alignment · Chuck Dedication · Integrated Reticle Library · IRIS XT · Reticle CIDRW Asyst (RF) · 2D Barcode reader · 24-char barcode reader twinscan · PEP High Dose (60W) · Agile for NXT · Spotless NXT · Exposure · GRIDMAPPER · GRIDMAPPER IF · Green Laser Attenuation · INFORM · BASELINER · BASELINER MMO Stability · BMMO2 · InformPro · InformPro2 · Overlay Optimizer FO · Overlay Optimizer 2 · Water cooling for electronics cabinet · 122mm Pellicle Frame Compatibility · Reorder Lot Service · Recipe Creator Light · Soft Wafer Load · Water Leak detection

OEM Model Description

The TWINSCAN NXT:1980Di delivers high productivity and reliability for volume production at advanced nodes with a global system uptime of >97%. Like the TWINSCAN NXT:2000i, this step-and-scan system is a high-productivity, dual-stage immersion lithography tool designed for volume production of 300 mm wafers at advanced nodes.