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Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The ASML AT 1100 is a Steppers and Scanners system. The AT 1100 has Scanner 12". AT:1100 is a 193 nm wavelength system with the industry's highest numerical aperture ArF lens (NA=0.75). Build upon ASML's successful 300 mm TWINSCAN dual-stage platform introduced in July 2000. The AT:1100 achieves a throughput of 93 wafers-per-hour at a dose of 20 mJ/cm2. By separating the align and expose operations, more extensive and accurate alignment and wafer surface height mapping of the entire 300 mm wafer can be performed without impacting throughput. This increase in metrology accuracy is essential for delivering the 100 nm critical dimension control and less than 20 nm overlay across the wafer at full throughput. The AT:1100 introduces new 4 kHz ArF laser technology which contribute to its leading productivity advantage. The AT:1100 is designed for seamless mix-and-match operation with ASML's TWINSCAN product family.Documents
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Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
108653
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
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Transaction Insured by Moov
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Refurbishment Services
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ASML
TWINSCAN AT:1100
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
108653
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The ASML AT 1100 is a Steppers and Scanners system. The AT 1100 has Scanner 12". AT:1100 is a 193 nm wavelength system with the industry's highest numerical aperture ArF lens (NA=0.75). Build upon ASML's successful 300 mm TWINSCAN dual-stage platform introduced in July 2000. The AT:1100 achieves a throughput of 93 wafers-per-hour at a dose of 20 mJ/cm2. By separating the align and expose operations, more extensive and accurate alignment and wafer surface height mapping of the entire 300 mm wafer can be performed without impacting throughput. This increase in metrology accuracy is essential for delivering the 100 nm critical dimension control and less than 20 nm overlay across the wafer at full throughput. The AT:1100 introduces new 4 kHz ArF laser technology which contribute to its leading productivity advantage. The AT:1100 is designed for seamless mix-and-match operation with ASML's TWINSCAN product family.Documents
No documents