Description
PLXI30 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -Configuration
No ConfigurationOEM Model Description
The PAS 5500/400C i-Line Step & Scan system has a variable NA (0.48 to 0.65) 4x projection lens, which combined with ASML’s AERIAL™ Illuminator provides 280nm resolution. ASML’s revolutionary Step & Scan stage technology enables users to take full advantage of the AERIAL™ Illumination intensity and advanced i-Line resists for throughputs of greater than 114 200mm wph. Long-term production overlay is less than 35nm. The PAS 5500/400C Step & Scan system’s resolution and productivity ensures the lowest operating cost for advanced i-Line lithography.Documents
No documents
Verified
CATEGORY
Steppers & Scanners
Last Verified: 12 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
149295
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/400C
CATEGORY
Steppers & Scanners
Last Verified: 12 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
149295
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
PLXI30 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -Configuration
No ConfigurationOEM Model Description
The PAS 5500/400C i-Line Step & Scan system has a variable NA (0.48 to 0.65) 4x projection lens, which combined with ASML’s AERIAL™ Illuminator provides 280nm resolution. ASML’s revolutionary Step & Scan stage technology enables users to take full advantage of the AERIAL™ Illumination intensity and advanced i-Line resists for throughputs of greater than 114 200mm wph. Long-term production overlay is less than 35nm. The PAS 5500/400C Step & Scan system’s resolution and productivity ensures the lowest operating cost for advanced i-Line lithography.Documents
No documents