We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. Read More
Description
I-Line StepperConfiguration
280nm, I-Line StepperOEM Model Description
The PAS 5500/400 is specified at 0.30um Current i-Line resists are capable to resolve structures down to 0.30 and 0.28um imaging. The maximum MA of the PAS 5500/400 is 0.65. Together with the AERIAL Illuminator the /400 will provide enough process latitude for mass production at 0.30um, extendable down to 0.28 and 0.25um. The highest resolution of the /400 maximized the number of i-Line layers in a full device layer stack.Documents
No documents
Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
90944
Wafer Sizes:
8"/200mm
Vintage:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/400
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
90944
Wafer Sizes:
8"/200mm
Vintage:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
I-Line StepperConfiguration
280nm, I-Line StepperOEM Model Description
The PAS 5500/400 is specified at 0.30um Current i-Line resists are capable to resolve structures down to 0.30 and 0.28um imaging. The maximum MA of the PAS 5500/400 is 0.65. Together with the AERIAL Illuminator the /400 will provide enough process latitude for mass production at 0.30um, extendable down to 0.28 and 0.25um. The highest resolution of the /400 maximized the number of i-Line layers in a full device layer stack.Documents
No documents