Description
I-Line StepperConfiguration
280nm, I-Line StepperOEM Model Description
The PAS 5500/400 is specified at 0.30um Current i-Line resists are capable to resolve structures down to 0.30 and 0.28um imaging. The maximum MA of the PAS 5500/400 is 0.65. Together with the AERIAL Illuminator the /400 will provide enough process latitude for mass production at 0.30um, extendable down to 0.28 and 0.25um. The highest resolution of the /400 maximized the number of i-Line layers in a full device layer stack.Documents
No documents
ASML
PAS 5500/400
Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
90944
Wafer Sizes:
8"/200mm
Vintage:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/400
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
90944
Wafer Sizes:
8"/200mm
Vintage:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
I-Line StepperConfiguration
280nm, I-Line StepperOEM Model Description
The PAS 5500/400 is specified at 0.30um Current i-Line resists are capable to resolve structures down to 0.30 and 0.28um imaging. The maximum MA of the PAS 5500/400 is 0.65. Together with the AERIAL Illuminator the /400 will provide enough process latitude for mass production at 0.30um, extendable down to 0.28 and 0.25um. The highest resolution of the /400 maximized the number of i-Line layers in a full device layer stack.Documents
No documents