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Description
Function: Exposure machine Structure: Modular CD 0.11Configuration
No ConfigurationOEM Model Description
This ASML step and scan tool supports 8" / 200m process nodes. The ASML 5500/1100B lithography system uses ASML's patented Athena wafer alignment system. The stepper is equipped with a 193 nm ArF laser and 0.75 NA and is capable of sub 100nm resolution. Applications for the ASML 5500/1100B include the fabrication of photonic ICs.Documents
No documents
Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
123817
Wafer Sizes:
Unknown
Vintage:
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/1100B
CATEGORY
Steppers & Scanners
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
123817
Wafer Sizes:
Unknown
Vintage:
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Function: Exposure machine Structure: Modular CD 0.11Configuration
No ConfigurationOEM Model Description
This ASML step and scan tool supports 8" / 200m process nodes. The ASML 5500/1100B lithography system uses ASML's patented Athena wafer alignment system. The stepper is equipped with a 193 nm ArF laser and 0.75 NA and is capable of sub 100nm resolution. Applications for the ASML 5500/1100B include the fabrication of photonic ICs.Documents
No documents