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ASML PAS 5500/1100B
    Description
    Function: Exposure machine Structure: Modular CD 0.11
    Configuration
    No Configuration
    OEM Model Description
    This ASML step and scan tool supports 8" / 200m process nodes. The ASML 5500/1100B lithography system uses ASML's patented Athena wafer alignment system. The stepper is equipped with a 193 nm ArF laser and 0.75 NA and is capable of sub 100nm resolution. Applications for the ASML 5500/1100B include the fabrication of photonic ICs.
    Documents

    No documents

    verified-listing-icon

    Verified

    CATEGORY
    Steppers & Scanners

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    123817


    Wafer Sizes:

    Unknown


    Vintage:

    2001


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    ASML PAS 5500/1100B

    ASML

    PAS 5500/1100B

    Steppers & Scanners
    Vintage: 2001Condition: Used
    Last VerifiedOver 60 days ago

    ASML

    PAS 5500/1100B

    verified-listing-icon
    Verified
    CATEGORY
    Steppers & Scanners
    Last Verified: Over 60 days ago
    listing-photo-ad602617d42447b59a65ad0ceaace0f8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/ad602617d42447b59a65ad0ceaace0f8/c89aa81f3fed4d84b145f2340c3dfa79_3_mw.jpg
    listing-photo-ad602617d42447b59a65ad0ceaace0f8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/ad602617d42447b59a65ad0ceaace0f8/f49b103f5654407eb69135a224257a45_1_mw.jpg
    listing-photo-ad602617d42447b59a65ad0ceaace0f8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/ad602617d42447b59a65ad0ceaace0f8/3d19c33cb84b4cdbb789558418a4c364_8_mw.png
    listing-photo-ad602617d42447b59a65ad0ceaace0f8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/ad602617d42447b59a65ad0ceaace0f8/1fdcc53de8104ed3b1778cc6249de7a8_5_mw.png
    listing-photo-ad602617d42447b59a65ad0ceaace0f8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/ad602617d42447b59a65ad0ceaace0f8/6cb2d1adfbdb4643a2800c7cdb4219e6_2_mw.jpg
    listing-photo-ad602617d42447b59a65ad0ceaace0f8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/ad602617d42447b59a65ad0ceaace0f8/2e60e054527a46e3b4ede040dab36b08_7_mw.png
    listing-photo-ad602617d42447b59a65ad0ceaace0f8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/ad602617d42447b59a65ad0ceaace0f8/76625166c7714ce0a406009b75893cc2_6_mw.png
    listing-photo-ad602617d42447b59a65ad0ceaace0f8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/ad602617d42447b59a65ad0ceaace0f8/cf5955722493439ebf0e20d86f799f27_4_mw.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    123817


    Wafer Sizes:

    Unknown


    Vintage:

    2001


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Function: Exposure machine Structure: Modular CD 0.11
    Configuration
    No Configuration
    OEM Model Description
    This ASML step and scan tool supports 8" / 200m process nodes. The ASML 5500/1100B lithography system uses ASML's patented Athena wafer alignment system. The stepper is equipped with a 193 nm ArF laser and 0.75 NA and is capable of sub 100nm resolution. Applications for the ASML 5500/1100B include the fabrication of photonic ICs.
    Documents

    No documents

    Similar Listings
    View All
    ASML PAS 5500/1100B

    ASML

    PAS 5500/1100B

    Steppers & ScannersVintage: 2001Condition: UsedLast Verified:Over 60 days ago