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ASML PAS 5000/55
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The PAS 5000/55A steppers feature a 0.48NA i-Line lens with a 21.2mm field, optimized for 0.5µm resolutions across IC productions and substrates like Silicon to GaAs. It boasts superior overlay performance due to its fast linear-electric exposure stage and phase grating alignment system. User-friendly software streamlines metrology tests in multi-stepper setups, promoting design rule optimization and enhanced yield. With only two alignment marks required, alignment time is minimized. Its swift stage and lack of need for send-ahead wafers guarantee peak productivity and precision. Additionally, it integrates a SMIF-compatible, high-speed reticle management system.
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    Verified

    CATEGORY
    Steppers & Scanners

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    128453


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
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    ASML PAS 5000/55

    ASML

    PAS 5000/55

    Steppers & Scanners
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    ASML

    PAS 5000/55

    verified-listing-icon
    Verified
    CATEGORY
    Steppers & Scanners
    Last Verified: Over 60 days ago
    listing-photo-7a78d645df1340b599ffd04046bc6570-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    128453


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The PAS 5000/55A steppers feature a 0.48NA i-Line lens with a 21.2mm field, optimized for 0.5µm resolutions across IC productions and substrates like Silicon to GaAs. It boasts superior overlay performance due to its fast linear-electric exposure stage and phase grating alignment system. User-friendly software streamlines metrology tests in multi-stepper setups, promoting design rule optimization and enhanced yield. With only two alignment marks required, alignment time is minimized. Its swift stage and lack of need for send-ahead wafers guarantee peak productivity and precision. Additionally, it integrates a SMIF-compatible, high-speed reticle management system.
    Documents

    No documents

    Similar Listings
    View All
    ASML PAS 5000/55

    ASML

    PAS 5000/55

    Steppers & ScannersVintage: 0Condition: UsedLast Verified:Over 60 days ago
    ASML PAS 5000/55

    ASML

    PAS 5000/55

    Steppers & ScannersVintage: 0Condition: UsedLast Verified:Over 60 days ago