Description
No descriptionConfiguration
Software Version: 8.1.0 Includes Option File: - PEP 2 (Color Graphics) - PEP 1/3/4 - Extended Filesystem (MEP) - Reticle Error Correction - Throughput Enhancement - Batch Status Light - 88 um Error Detection - Chuckspot Detection - Wafer Tilt MonitorOEM Model Description
The PAS 5000/55A steppers feature a 0.48NA i-Line lens with a 21.2mm field, optimized for 0.5µm resolutions across IC productions and substrates like Silicon to GaAs. It boasts superior overlay performance due to its fast linear-electric exposure stage and phase grating alignment system. User-friendly software streamlines metrology tests in multi-stepper setups, promoting design rule optimization and enhanced yield. With only two alignment marks required, alignment time is minimized. Its swift stage and lack of need for send-ahead wafers guarantee peak productivity and precision. Additionally, it integrates a SMIF-compatible, high-speed reticle management system.Documents
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ASML
PAS 5000/55
Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
112208
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5000/55
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
112208
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Software Version: 8.1.0 Includes Option File: - PEP 2 (Color Graphics) - PEP 1/3/4 - Extended Filesystem (MEP) - Reticle Error Correction - Throughput Enhancement - Batch Status Light - 88 um Error Detection - Chuckspot Detection - Wafer Tilt MonitorOEM Model Description
The PAS 5000/55A steppers feature a 0.48NA i-Line lens with a 21.2mm field, optimized for 0.5µm resolutions across IC productions and substrates like Silicon to GaAs. It boasts superior overlay performance due to its fast linear-electric exposure stage and phase grating alignment system. User-friendly software streamlines metrology tests in multi-stepper setups, promoting design rule optimization and enhanced yield. With only two alignment marks required, alignment time is minimized. Its swift stage and lack of need for send-ahead wafers guarantee peak productivity and precision. Additionally, it integrates a SMIF-compatible, high-speed reticle management system.Documents
No documents