Semiconductors control a host of functions in electronic equipment. Nikon offers a stellar lineup of cutting-edge lithography systems that support precision circuit design down to the nanometer level.

NIKON

NSR-S208D

Lithography Step and repeat  scanning system
Fab Section - Lithography

Nikon NSR-S208D.pdf

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NIKON NSR-S208D.pdf

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Lithography Step and repeat scanning system

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NIKON S208 Krf Scanner NIKON S208 Krf Scanner [248NM KRF SCANNER - NON CRITCAL LAYER] 29-Aug-08

NIKON S208 NIKON S208 [248NM KRF SCANNER - NON CRITCAL LAYER] 29-Jul-08

Nikon KrF lithography machines use 248nm wavelength KrF excimer lasers as exposure light sources, which are suitable for more sophisticated semiconductor processes and are widely used in the manufacture of high-performance semiconductor devices, including microprocessors, dynamic random access memory (DRAM), and complex logic and mixed signal chips. These lithography machines are key equipment for achieving high-precision semiconductor device manufacturing, and play an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.


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