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FT-IR Spectrometer for up to 300mm Wafers, on FTS-175 Spectrometer with Pike MAP300 Scanning StageOEM Model Description
The QS1200 is a desktop FTIR metrology tool designed for advanced semiconductor fabs. It is used for dopant monitoring, epi thickness measurement, and other applications. The tool can accommodate SEMI standard wafers of 100, 125, 150, 200, and 300mm diameter, as well as odd shaped wafer pieces and 2mm thick silicon slices. An optional single wafer mapping stage is available for all wafer sizes. The QS1200 also features unique algorithms for instant qualification of SOI, SiC, and other epitaxial films. Its built-in intelligence extends its applicability to almost every film material imaginable. Additionally, it is versatile enough to qualify the thickness of recycled test wafers for rapid payback. This tool provides a new level of integration of the FTIR technique utilizing proven optical technology.Documents
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
QS1200
Verified
CATEGORY
Spectrometer / SIMS
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
93673
Wafer Sizes:
Unknown
Vintage:
Unknown
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Refurbishment Services
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
QS1200
CATEGORY
Spectrometer / SIMS
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
93673
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
FT-IR Spectrometer for up to 300mm Wafers, on FTS-175 Spectrometer with Pike MAP300 Scanning StageOEM Model Description
The QS1200 is a desktop FTIR metrology tool designed for advanced semiconductor fabs. It is used for dopant monitoring, epi thickness measurement, and other applications. The tool can accommodate SEMI standard wafers of 100, 125, 150, 200, and 300mm diameter, as well as odd shaped wafer pieces and 2mm thick silicon slices. An optional single wafer mapping stage is available for all wafer sizes. The QS1200 also features unique algorithms for instant qualification of SOI, SiC, and other epitaxial films. Its built-in intelligence extends its applicability to almost every film material imaginable. Additionally, it is versatile enough to qualify the thickness of recycled test wafers for rapid payback. This tool provides a new level of integration of the FTIR technique utilizing proven optical technology.Documents
No documents