Description
– It is a FE SEM with Ga FIB column, airlock, Kliendiek MM3 micro-manipulator, and multi-chemistry gas-injection system (currently it runs C and W for depositions, though it has capacity for others in non-heated precursor chambers). – It is also set up with a Leica VCT100 cryo-stage, though the interlock is currently not functional (can still be used for cryo during milling, but requires samples to be loaded and unloaded at room temperature and in atmosphere). – Oxford EDS systemConfiguration
No ConfigurationOEM Model Description
The NVision 40 operates with two beams, one electron beam and one ion beam. Both beams can be used independently of each other to generate images using the secondary electrons emitted from the surface of the specimen. The ion beam can be used for imaging in addition material removal or coating purposes.Documents
No documents
ZEISS / CARL ZEISS
NVision 40
Verified
CATEGORY
SEM
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
50917
Wafer Sizes:
Unknown
Vintage:
Unknown
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ZEISS / CARL ZEISS
NVision 40
Verified
CATEGORY
SEM
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
50917
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
– It is a FE SEM with Ga FIB column, airlock, Kliendiek MM3 micro-manipulator, and multi-chemistry gas-injection system (currently it runs C and W for depositions, though it has capacity for others in non-heated precursor chambers). – It is also set up with a Leica VCT100 cryo-stage, though the interlock is currently not functional (can still be used for cryo during milling, but requires samples to be loaded and unloaded at room temperature and in atmosphere). – Oxford EDS systemConfiguration
No ConfigurationOEM Model Description
The NVision 40 operates with two beams, one electron beam and one ion beam. Both beams can be used independently of each other to generate images using the secondary electrons emitted from the surface of the specimen. The ion beam can be used for imaging in addition material removal or coating purposes.Documents
No documents
Similar Listings
View AllNo Similar Listings