ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

ZEISS / CARL ZEISS

SUPRA 25

Based on a fully modular concept, the AURIGA CrossBeam workstations can be tailored to the individual customer’s applications – today and in the future. Starting with a high-performance FE-SEM platform, the system can be upgraded with a wide variety of hardware and software options, such as FIB, GIS, local charge compensation system and different detectors.

AURIGA

The LSM 44 launched by Carl Zeiss in 1982 was the first commercial laser scanning microscope. In 1996, Zeiss introduced ConfoCor1, the first fluorescence correlation spectrometer, which paved the way for novel research results for biochemists worldwide.

LSM 44

Analytical Research SEM
EVO 18 provides excellent quality imaging results from an analytical micro- scope with the capability to handle all material types. EVO 18 offers Energy  and Wavelength Dispersive Spectroscopy (EDS & WDS) ports as standard.  A fully integrated particle analysis and identification solution for advanced morphology and chemical analysis is available as an option. For new levels of performance, particularly at probe currents associated with X-ray analysis, choose the LaB6 high brightness source upgrade path. Improved low kV performance and enhanced topography information is offered on EVO 18 by the 5 segment diode BSE detector. For non-conducting samples, increase your analytical resolution by using the optional BeamSleeve. Whatever your materials analysis challenge  - with EVO 18 you focus your imaging expectations.

EVO 18

SIGMA 300

EVO 40

EVO MA25

Zeiss EVO 15 Scanning Electron Microscope. This is a flexible variable pressure SEM with wide range of detectors and analysis software. Sample prep is supported with a Cressington gold sputter coater and a Leica carbon coater. 

EVO MA15

High throughput in analytics and imaging, high resolution under all conditions.

CROSSBEAM 550

EVO LS10

The GeminiSEM 500 Nano-twin lens lets you image beam-sensitive, nanoscalestructures with minutes detail at low beam energy. The efficient detection allows you to operate at low currents for minimum beam damage, while enjoying excellent materials contrasts.

GeminiSEM 500

The LSM 510 META is predestined for all multiple fluorescence labelings in which heavy crosstalk or spectrally close emission signals prevent separation into classical detection channels. In genetic experiments with the LSM 510 META – whether it’s gene expression in the study of protein functions, or in situ hybridization in chromosome analysis – your multi-labeled specimens will show themselves in their true colors.

LSM 510 META

The SUPRA® 55 is a state-of-the-art instrument that offers the highest resolution available today, comparable to in-lens instruments. It is designed for the most demanding applications in nanotechnology, with sub-nanometer resolution readily attainable. The instrument features a superb large fully eucentric 5” stage and a large multi-functional specimen chamber, making it an ideal choice for researchers and scientists working in the field of nanotechnology. With its advanced capabilities and high performance, the SUPRA® 55 is sure to meet the needs of even the most demanding users.

SUPRA 55

The NVision 40 operates with two beams, one electron beam and one ion beam. Both beams can be used independently of each other to generate images using the secondary electrons emitted from the surface of the specimen. The ion beam can be used for imaging in addition material removal or coating purposes.

NVision 40 

EVO 15 demonstrates the flexibility concept of the EVO family and excels in analytical applications. Opt for the larger vacuum chamber of the EVO 15, and add variable pressure for imaging and analysis of non-conductive samples or parts, and you have a versatile, multi-purpose solution for central microscopy facilities or industrial quality assurance laboratories.

EVO 15

The LSM 510 NLO is ideal for the gentle in-depth analysis of live specimens, including whole organisms. The LSM 510 NLO is outstanding for its unparalleled selectivity: Even low concentrations of fluorochromes are registered thanks to tunable multiphoton excitation and non-descanned detection. With the depth-selective excitation unique to the LSM 510 NLO, your bleaching experiments will succeed with pinpoint accuracy. 

LSM 510 NLO

To address these demands, the AURIGA CrossBeam workstation series has been designed to accommodate an optimum number of accessories/detectors only depending on the size of the vacuum chamber. Due to a large 6” stage vacuum chamber, the AURIGA 60 essentially broadens the application spectrum of the Carl Zeiss CrossBeam technology. Up to 23 analytical or other accessories for diverse chemical or physical experiments can be mounted on the chamber, e.g. different detectors or a cryogenic transfer unit.

AURIGA 60

SUPRA 35

Enabling efficient analysis - ZEISS GeminiSEM 460 and its Gemini 2 column serve the most challenging tasks in analytical microscopy. Switch seamlessly between imaging and analytical conditions over a wide range of probe currents.

GeminiSEM 460

EVO 10 defies expectations to offer the largest X-Y stage travel and best repeatability in its class. It’s ideal  for high throughput applications such as particle and gunshot residue (GSR) analysis.

EVO 10

The EVO 25 chamber is tailor-made for automotive and aerospace or steel and metals applications that use the largest specimens. The chamber accommodates samples up to a maximum specimen diameter of 300 mm and a maximum height of 210 mm. Expand EVO 25 capabilities further with an optional 80 mm Z travel stage that can handle weights up to 2 kg including tilt.

EVO 25

Ideal for core facilities - ZEISS GeminiSEM 360 with its Gemini 1 electron optical column delivers high resolution imaging and analytics over the widest range of applications and sample types. ​

GeminiSEM 360

The EVO MA10 is a Materials Analysis SEM (Scanning Electron Microscope) that offers excellent quality imaging results for all material types. It is not limited to small samples, as its large chamber can accommodate specimens up to 200mm in diameter with stage travels of up to 100mm. This is made possible by the unique combination of chamber geometry, inclined detectors, and conical objectives lens, which allows for an analytical working distance of 8.5mm. With the EVO MA10, you can achieve high-quality imaging results for a wide range of sample sizes and materials. 

EVO MA10

The SUPRA® 55VP is a high-resolution scanning electron microscope that features proprietary VP (variable pressure) technology for the GEMINI® column. This technology enables direct imaging of non-conductive or delicate specimens without the need for complicated sample preparation techniques. The VP technology is also available on the SUPRA® 40 VP and SUPRA® 60 VP. The operation of high vacuum mode or variable pressure mode can be easily selected with a simple mouse click. The SUPRA® 55VP offers the highest resolution available today, comparable with “in-lens instruments”, combined with a superb large fully eucentric 5” stage and a large multi-functional specimen chamber. It has been designed for the most demanding applications in nanotechnology, with sub-nm resolution readily attainable. This makes the SUPRA® 55VP a versatile and user-friendly tool for a wide range of applications.

SUPRA 55VP

EVO LS15

The extraordinary variability of the LSM 5 PASCAL gives you unprecedented freedom of application. Whether multiple fluorescence imaging in cellular biology and molecular genetics, 3D structural analysis in neurobiology or 4D time-lapse series of intracellular ion concentrations in physiological studies: with the LSM 5 PASCAL you can meet any experimental challenge.

LSM 5 PASCAL

The new standard for surface imaging – introducing ZEISS GeminiSEM 560, Gemini 3, and its new electron optical engine Smart Autopilot. It delivers the highest resolution in the family at all working conditions.​

GeminiSEM 560

Crossbeam 340 is a workstation that allows microscopic examination and modification of suitable specimens. The workstation allows you to perform the full range of FESEM and CrossBeam applications

CROSSBEAM 340

Maximum sample variety due to variable pressure mode, wide range of in-situ experiments.

CROSSBEAM 350

High throughput in analytics and imaging, maximum ease of use, high resolution under all conditions, simultaneous SE and EsB imaging. 

CROSSBEAM 540

SUPRA 35VP

The SUPRA® 60VP makes it possible to image non-conducting specimens without specimen coating, therefore minimising preparation time and increasing throughput.

SUPRA 60VP

SIGMA 500

MERLIN

EVO LS25

The large cylindrical chamber with a refined 6" super eucentric stage and 8" integrated airlock offers the perfect solution for full wafers and cross sectional semiconductor applications, and for users who need to image a variety of large samples. 

SUPRA 60

ULTRA 55

The 1540EsB CrossBeam® is a powerful tool that combines a fully integrated Energy and angle selective Backscattered electron (EsB) detector. This instrument offers ultra high resolution for surface sensitive SE imaging and compositional information through BSE imaging. The new EsB detection principle features an integrated filtering grid to enhance the image quality and requires no additional adjustments. The EsB detection principle is less sensitive to edge contrast and charging effects, which increases the accuracy in measurements of interfaces, particles, and features.

1540 EsB

Zeiss Ultra Plus allow you to capture, analyze and supplement high-resolution images to get total information out of your sample. The complete detection system of the Ultra Plus combines a high-tech Gemini FE-SEM column with various detectors: the In-lens & SE-Detector for high resolution images, the in-lens Energy selective Backscatter Detector (EsB) & Annular Backscatter Detector (AsB) for impressive material contrast of any samples, and Energy Dispersive Spectroscopy (EDS) for elemental analysis

ULTRA PLUS

EVO 50

1560

NEON 40EsB

LSM 5

The SUPRA 40 is an ideal solution for many applications such as failure analysis, process control, cryo, and nanoanalysis. With the well balanced combination of a large eucentric stage, analytical multi-ported chamber, extended performance GEMINI column and variable pressure capabilities it represents the versatile workhorse of the SUPRA® family. 

SUPRA 40

The SUPRA® series with the GEMINI® field emission column has excellent low voltage imaging capabilities. Low voltage imaging with low dose energy avoids surface damaging of delicate biological samples. The efficient signal collection and the high contrast dynamic range of the GEMINI® column is particularly useful for low contrast biological samples. With the VP (variable pressure) mode on the SUPRA® 40VP or SUPRA® 55VP non-conducting biological samples can be imaged without prior preparation saving time and avoiding possible artefacts introduced with specimen preparation like drying, fixation and conductive coating. Another major application for biological specimens or colloid chemistry is cryo-FE-SEM. The SUPRA® range has a large cryo port for adaptation of cryo systems on the chamber or a cryo shuttle with offchamber cryo preparation. With the SUPRA® superb high resolution imaging capabilities it is now possible to image details previously only seen with replicas in the TEM.

SUPRA 40VP

EVO 60

The LSM 510 has been designed, built and tested in conformity with the standards DIN EN 61010-1 (IEC 1010-1) "Safety requirements for electrical instrumentation and control and laboratory apparatus", and DIN EN 60825-1 (IEC publication 825-1) "Safety of laser equipment", and taking relevant CSA and UL specifications into account.

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

ZEISS / CARL ZEISS

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LSM 510 META

GeminiSEM 500

SUPRA 55

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