The EVO MA10 is a Materials Analysis SEM (Scanning Electron Microscope) that offers excellent quality imaging results for all material types. It is not limited to small samples, as its large chamber can accommodate specimens up to 200mm in diameter with stage travels of up to 100mm. This is made possible by the unique combination of chamber geometry, inclined detectors, and conical objectives lens, which allows for an analytical working distance of 8.5mm. With the EVO MA10, you can achieve high-quality imaging results for a wide range of sample sizes and materials. 

ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

EVO MA10

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