The LSM 510 NLO is ideal for the gentle in-depth analysis of live specimens, including whole organisms. The LSM 510 NLO is outstanding for its unparalleled selectivity: Even low concentrations of fluorochromes are registered thanks to tunable multiphoton excitation and non-descanned detection. With the depth-selective excitation unique to the LSM 510 NLO, your bleaching experiments will succeed with pinpoint accuracy. 

ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

LSM 510 NLO

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