Hitachi High-Tech offers a range of advanced industrial equipment solutions for assembly and processing machines used in the production of lithium batteries, auto parts and advanced film. Also offered R&D equipment necessary for the development of FC, organic materials, and catalyst materials.

HITACHI

S-7000

The Hitachi S-7000 CD SEM is an in-process evaluation tool for monitoring wafers during the during the various process steps. Non-destructive wafer inspection is ideal for observing complete wafers to identify problems such as stacking-faults, deep holes, etc.

Wafer Size: Accommodates 4", 5" and 6" wafers. Set size = 5".
Secondary Electron Image Resolution: 15nm (150 angstroms) at 1kV
Magnification: 100x to 100,000x
CD Measurement Range: 0.05 to 100 microns
Electron Beam Source: Field emission electron gun
Accelerating Voltage(V0): 0.7~3kV (in increments of 100V)
Emission Extracting Voltage(V1): 0~6.3kV
Lens System: 2-stage electromagnetic lens reduction
Objective Lens Aperture: Moveable type(4 openings selectable and alignable outside column
Stigmator: 8-pole electromagnetic type(X,Y)
Scanning Coil: 2-stage electromagnetic type

Specimen Stage Movement: X-direction = 150nm, Y-direction = 150nm, Z-direction (working distance) = 5 to 15mm, T (tilt) angle = 0 to 60 degrees, R (rotation) angle = 360 degrees

Wafer Holder: Holder replaceable for each wafer size
Wafer Setting: Auto vacuum chucking using orientation flat reference
Wafer Transfer: Wafer cassette to wafer holder in loader chamber (automatic)
Auto Loader: Single-cassette loading, random accessing


S-7000

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HITACHI

S-7000

HITACHI

S-7000

HITACHI

S-7000

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