Description
Dual-Beam System: Combines high-resolution scanning electron microscope (SEM) and FIB capabilities in one system. Resolution: Achieves up to 1.2 nm (electron) and 7 nm (ion) for detailed imaging and precise milling. High-Brightness Sources: Equipped with an electron source and gallium liquid-metal ion source, delivering high performance for advanced analysis. Flexible Vacuum Modes: Includes Environmental SEM (ESEM) mode, ideal for imaging non-conductive or sensitive samples. Gas Injection System: Allows for precision deposition and etching, enhancing material processing applications. Motorised 5-Axis Stage: Enables versatile sample positioning and manipulation for detailed examination. Carbon Milling Capability: Supports additional milling applications for enhanced sample preparation. Digital Imaging Integration: Provides high-quality imaging with upgrade options for extended functionality. Ancillary Equipment: Comes with associated power supply, pumps, chiller, and related accessories. Ideal Applications: Suitable for high-demand research and industrial analysis across materials science, electronics, and nanotechnology fields.Configuration
No ConfigurationOEM Model Description
The FEI Quanta 3D FEG is a dual beam system that combines a field emission scanning electron column and an ion column with a Gallium ion source. It is equipped with multiple analytical and manipulative tools, allowing for the application of different techniques and methods within the same chamber. The system features three imaging modes: high vacuum, low vacuum, and ESEM, and is equipped with high-resolution imaging and surface analysis methodologies such as BSE, SE, ISE, and EDS. The ion and electron beam can be used in combination with a gas injection system to deposit thin layers of Pt to protect an exploration site. The instrument also has a Peltier cooling stage and an automated nanomanipulator from Omniprobe.Documents
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THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
QUANTA 3D FEG
Verified
CATEGORY
SEM / FIB
Last Verified: 8 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116601
Wafer Sizes:
Unknown
Vintage:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View AllTHERMOFISHER SCIENTIFIC / FEI / PHILLIPS
QUANTA 3D FEG
CATEGORY
SEM / FIB
Last Verified: 8 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116601
Wafer Sizes:
Unknown
Vintage:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Dual-Beam System: Combines high-resolution scanning electron microscope (SEM) and FIB capabilities in one system. Resolution: Achieves up to 1.2 nm (electron) and 7 nm (ion) for detailed imaging and precise milling. High-Brightness Sources: Equipped with an electron source and gallium liquid-metal ion source, delivering high performance for advanced analysis. Flexible Vacuum Modes: Includes Environmental SEM (ESEM) mode, ideal for imaging non-conductive or sensitive samples. Gas Injection System: Allows for precision deposition and etching, enhancing material processing applications. Motorised 5-Axis Stage: Enables versatile sample positioning and manipulation for detailed examination. Carbon Milling Capability: Supports additional milling applications for enhanced sample preparation. Digital Imaging Integration: Provides high-quality imaging with upgrade options for extended functionality. Ancillary Equipment: Comes with associated power supply, pumps, chiller, and related accessories. Ideal Applications: Suitable for high-demand research and industrial analysis across materials science, electronics, and nanotechnology fields.Configuration
No ConfigurationOEM Model Description
The FEI Quanta 3D FEG is a dual beam system that combines a field emission scanning electron column and an ion column with a Gallium ion source. It is equipped with multiple analytical and manipulative tools, allowing for the application of different techniques and methods within the same chamber. The system features three imaging modes: high vacuum, low vacuum, and ESEM, and is equipped with high-resolution imaging and surface analysis methodologies such as BSE, SE, ISE, and EDS. The ion and electron beam can be used in combination with a gas injection system to deposit thin layers of Pt to protect an exploration site. The instrument also has a Peltier cooling stage and an automated nanomanipulator from Omniprobe.Documents
No documents