Description
FEI FIB 800 Focused Ion BeamConfiguration
System Joystick Oil pump Hard Disk Drive Prelens column Beam current: 1 pA - 11 nA Deposition system: EE Vacuum types: Turbo molecular pump Mechanical pump Ion getter pump Stage type: Motor stage for XL50, 8" Type: Load lock Detector: CDEM Operating system: Windows NT 4.0OEM Model Description
The FEI FIB 800 is a state-of-the-art Focused Ion Beam (FIB) system that is utilized for a variety of applications, including circuit editing, defect and failure analysis, TEM lamella preparation, nanofabrication, nanoprototyping, and MEMS. It employs a Magnum ion column and boasts a milling power of 21nA beam current. The system can accommodate samples with diameters up to 200mm and features a 5-axis motorized eucentric tilt stage. Additionally, it includes a gas injection system with up to four injectors and a vacuum system with column IGP, air-cooled Turbo, and mechanical PVP.Documents
No documents
CATEGORY
SEM / FIB
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
68765
Wafer Sizes:
Unknown
Vintage:
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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THERMOFISHER SCIENTIFIC / FEI / PHILIPS
FIB 800
CATEGORY
SEM / FIB
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
68765
Wafer Sizes:
Unknown
Vintage:
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
FEI FIB 800 Focused Ion BeamConfiguration
System Joystick Oil pump Hard Disk Drive Prelens column Beam current: 1 pA - 11 nA Deposition system: EE Vacuum types: Turbo molecular pump Mechanical pump Ion getter pump Stage type: Motor stage for XL50, 8" Type: Load lock Detector: CDEM Operating system: Windows NT 4.0OEM Model Description
The FEI FIB 800 is a state-of-the-art Focused Ion Beam (FIB) system that is utilized for a variety of applications, including circuit editing, defect and failure analysis, TEM lamella preparation, nanofabrication, nanoprototyping, and MEMS. It employs a Magnum ion column and boasts a milling power of 21nA beam current. The system can accommodate samples with diameters up to 200mm and features a 5-axis motorized eucentric tilt stage. Additionally, it includes a gas injection system with up to four injectors and a vacuum system with column IGP, air-cooled Turbo, and mechanical PVP.Documents
No documents