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MATTSON HELIOS XP
    Description
    No description
    Configuration
    2C
    OEM Model Description
    The Helios XP features an advanced temperature measurement and control system combined with an active compensation algorithm for different wafer emissivities. The Helios XP can fully satisfy technical requirements in manufacturing of different semiconductor devices across various technology nodes (130 nm to 5 nm and below). The Helios XP has also demonstrated high reliability, long mean-time-between-clean, and more than 20 to 30% benefit in overall cost of ownership in mass production. It is the ideal RTP system for advanced semiconductor development and manufacturing.
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    verified-listing-icon

    Verified

    CATEGORY
    RTP/RTA

    Last Verified: Yesterday

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    158693


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
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    MATTSON HELIOS XP

    MATTSON

    HELIOS XP

    RTP/RTA
    Vintage: 0Condition: Used
    Last VerifiedYesterday

    MATTSON

    HELIOS XP

    verified-listing-icon
    Verified
    CATEGORY
    RTP/RTA
    Last Verified: Yesterday
    listing-photo-a29f179ddb98479fbf77ec637e8d2b01-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    158693


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    2C
    OEM Model Description
    The Helios XP features an advanced temperature measurement and control system combined with an active compensation algorithm for different wafer emissivities. The Helios XP can fully satisfy technical requirements in manufacturing of different semiconductor devices across various technology nodes (130 nm to 5 nm and below). The Helios XP has also demonstrated high reliability, long mean-time-between-clean, and more than 20 to 30% benefit in overall cost of ownership in mass production. It is the ideal RTP system for advanced semiconductor development and manufacturing.
    Documents

    No documents

    Similar Listings
    View All
    MATTSON HELIOS XP

    MATTSON

    HELIOS XP

    RTP/RTAVintage: 0Condition: UsedLast Verified:Yesterday