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MATTSON / STEAG / AST HEATPULSE 2101
    Description
    Rapid Thermal Processing System for 3 Applications: Implant Activation, Silicide Formation, Oxide Reflow (PSG & BPSG), Alloying Cassette to Cassette Handling of 3”-5” Wafers Microprocessor-controlled 60-100 Wafers per Hour Throughput, Depending on Anneal Cycle 400-1150ºC Steady-State Temperature Range 1-300 Seconds Anneal Time Controlled Ambient for up to 4 Gases
    Configuration
    No Configuration
    OEM Model Description
    None Provided
    Documents

    No documents

    MATTSON / STEAG / AST

    HEATPULSE 2101

    verified-listing-icon

    Verified

    CATEGORY
    RTP/RTA

    Last Verified: Over 60 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    16249

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

    Have Additional Questions?
    Logistics Support
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    Transaction Insured by Moov
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    Refurbishment Services
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    MATTSON / STEAG / AST HEATPULSE 2101

    MATTSON / STEAG / AST

    HEATPULSE 2101

    RTP/RTA
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    MATTSON / STEAG / AST

    HEATPULSE 2101

    verified-listing-icon
    Verified
    CATEGORY
    RTP/RTA
    Last Verified: Over 60 days ago
    listing-photo-ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/Ot4uSyt7j-OkIRBJeE4orTieeZmN71mOLX5X1zTe7fk/ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q/0qcDqzRkf3-ztVZnYijB97cMmFUc22yWxRY-gVjhD7o_20190315_091655_f
    listing-photo-ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/Ot4uSyt7j-OkIRBJeE4orTieeZmN71mOLX5X1zTe7fk/ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q/z9wNnuKXgMFjUJtFxAxpLp_y9OrSIS3SXLBiX_WMRJ4_20190315_091655_f
    listing-photo-ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/Ot4uSyt7j-OkIRBJeE4orTieeZmN71mOLX5X1zTe7fk/ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q/IfjzAY1YDgq1Af_Ky8RpsgsYhudtRwO79gkSdj9FMiQ_20190315_091655_f
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    16249

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Rapid Thermal Processing System for 3 Applications: Implant Activation, Silicide Formation, Oxide Reflow (PSG & BPSG), Alloying Cassette to Cassette Handling of 3”-5” Wafers Microprocessor-controlled 60-100 Wafers per Hour Throughput, Depending on Anneal Cycle 400-1150ºC Steady-State Temperature Range 1-300 Seconds Anneal Time Controlled Ambient for up to 4 Gases
    Configuration
    No Configuration
    OEM Model Description
    None Provided
    Documents

    No documents

    Similar Listings
    View All
    MATTSON / STEAG / AST HEATPULSE 2101

    MATTSON / STEAG / AST

    HEATPULSE 2101

    RTP/RTAVintage: 0Condition: UsedLast Verified: Over 60 days ago