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MATTSON / STEAG / AST HEATPULSE 2101
  • MATTSON / STEAG / AST HEATPULSE 2101
  • MATTSON / STEAG / AST HEATPULSE 2101
  • MATTSON / STEAG / AST HEATPULSE 2101
Description
Rapid Thermal Processing System for 3 Applications: Implant Activation, Silicide Formation, Oxide Reflow (PSG & BPSG), Alloying Cassette to Cassette Handling of 3”-5” Wafers Microprocessor-controlled 60-100 Wafers per Hour Throughput, Depending on Anneal Cycle 400-1150ºC Steady-State Temperature Range 1-300 Seconds Anneal Time Controlled Ambient for up to 4 Gases
Configuration
No Configuration
OEM Model Description
None Provided
Documents

No documents

MATTSON / STEAG / AST

HEATPULSE 2101

verified-listing-icon

Verified

CATEGORY
RTP/RTA

Last Verified: Over 60 days ago

Key Item Details
Condition:

Used

Operational Status:

Unknown

Product ID:

16249

Wafer Sizes:

Unknown

Vintage:

Unknown

Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View All
MATTSON / STEAG / AST HEATPULSE 2101

MATTSON / STEAG / AST

HEATPULSE 2101

RTP/RTA
Vintage: 0Condition: Used
Last VerifiedOver 60 days ago

MATTSON / STEAG / AST

HEATPULSE 2101

verified-listing-icon
Verified
CATEGORY
RTP/RTA
Last Verified: Over 60 days ago
listing-photo-ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/Ot4uSyt7j-OkIRBJeE4orTieeZmN71mOLX5X1zTe7fk/ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q/0qcDqzRkf3-ztVZnYijB97cMmFUc22yWxRY-gVjhD7o_20190315_091655_f
listing-photo-ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/Ot4uSyt7j-OkIRBJeE4orTieeZmN71mOLX5X1zTe7fk/ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q/z9wNnuKXgMFjUJtFxAxpLp_y9OrSIS3SXLBiX_WMRJ4_20190315_091655_f
listing-photo-ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/Ot4uSyt7j-OkIRBJeE4orTieeZmN71mOLX5X1zTe7fk/ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q/IfjzAY1YDgq1Af_Ky8RpsgsYhudtRwO79gkSdj9FMiQ_20190315_091655_f
Key Item Details
Condition:

Used

Operational Status:

Unknown

Product ID:

16249

Wafer Sizes:

Unknown

Vintage:

Unknown

Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Rapid Thermal Processing System for 3 Applications: Implant Activation, Silicide Formation, Oxide Reflow (PSG & BPSG), Alloying Cassette to Cassette Handling of 3”-5” Wafers Microprocessor-controlled 60-100 Wafers per Hour Throughput, Depending on Anneal Cycle 400-1150ºC Steady-State Temperature Range 1-300 Seconds Anneal Time Controlled Ambient for up to 4 Gases
Configuration
No Configuration
OEM Model Description
None Provided
Documents

No documents

Similar Listings
View All
MATTSON / STEAG / AST HEATPULSE 2101

MATTSON / STEAG / AST

HEATPULSE 2101

RTP/RTAVintage: 0Condition: UsedLast Verified:Over 60 days ago