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ANNEALSYS AS-One

Description

The AS-One is a versatile RTP system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes. Rapid thermal annealing (RTA) Implant annealing Ohmic contact annealing (III-V and SiC) Rapid Thermal Oxidation (RTO) Rapid Thermal Nitridation (RTN) Selenization (CIGS solar cells) CVD of graphene and h-BN (hexagonal boron nitride) Thermal annealing of polymers Etc.

Configuration

No Configuration

OEM Model Description

The Annealsys AS-One is a system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes. It is a versatile system that can perform various processes such as rapid thermal annealing (RTA), implant annealing, ohmic contact annealing, rapid thermal oxidation (RTO), rapid thermal nitridation (RTN), selenization, and CVD of graphene and h-BN (hexagonal boron nitride).

Documents

No documents

ANNEALSYS

AS-One

verified-listing-icon

Verified

CATEGORY

RTP/RTA

Last Verified: 18 days ago

Key Item Details

Condition:

Refurbished

Operational Status:

Unknown

Product ID:

138663

Wafer Sizes:

2"/50mm, 3"/75mm, 4"/100mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

Similar Listings

ANNEALSYS AS-One

ANNEALSYS

AS-One

Vintage: 0Condition: Refurbished

Last Verified18 days ago

ANNEALSYS

AS-One

verified-listing-icon

Verified

CATEGORY

RTP/RTA

Last Verified: 18 days ago

listing-photo-c36f30e1cccf499d909f54679ec8f062-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2186/c36f30e1cccf499d909f54679ec8f062/9cae25c345dd470c854a6f9ffd7d03d5_annealsysasonerapidthermalprocessingequipment_mw.jpeg

Key Item Details

Condition:

Refurbished

Operational Status:

Unknown

Product ID:

138663

Wafer Sizes:

2"/50mm, 3"/75mm, 4"/100mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

Description

The AS-One is a versatile RTP system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes. Rapid thermal annealing (RTA) Implant annealing Ohmic contact annealing (III-V and SiC) Rapid Thermal Oxidation (RTO) Rapid Thermal Nitridation (RTN) Selenization (CIGS solar cells) CVD of graphene and h-BN (hexagonal boron nitride) Thermal annealing of polymers Etc.

Configuration

No Configuration

OEM Model Description

The Annealsys AS-One is a system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes. It is a versatile system that can perform various processes such as rapid thermal annealing (RTA), implant annealing, ohmic contact annealing, rapid thermal oxidation (RTO), rapid thermal nitridation (RTN), selenization, and CVD of graphene and h-BN (hexagonal boron nitride).

Documents

No documents

Similar Listings

ANNEALSYS AS-One

ANNEALSYS

AS-One

RTP/RTAVintage: 0Condition: RefurbishedLast Verified:18 days ago