Description
Lamp annealerConfiguration
No ConfigurationOEM Model Description
The Centura RTP XE is a Rapid Thermal Processing system introduced in 1997. It features improved productivity, higher throughput, and reduced power consumption. It also includes the TempMatchTM temperature calibration tool for precise temperature matching among multiple chambers and systems. New applications include In-Situ Steam Generation, Nitric Oxide nitridation for gate dielectrics, and BPSG reflow capability. The system is available for both 200mm and 300mm applications, delivering process uniformity for 0.18mm devices and slip-free results up to 1100°C at a rate of 100°C/sec.Documents
No documents
CATEGORY
RTP/RTA
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
132674
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA RTP XE
CATEGORY
RTP/RTA
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
132674
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Lamp annealerConfiguration
No ConfigurationOEM Model Description
The Centura RTP XE is a Rapid Thermal Processing system introduced in 1997. It features improved productivity, higher throughput, and reduced power consumption. It also includes the TempMatchTM temperature calibration tool for precise temperature matching among multiple chambers and systems. New applications include In-Situ Steam Generation, Nitric Oxide nitridation for gate dielectrics, and BPSG reflow capability. The system is available for both 200mm and 300mm applications, delivering process uniformity for 0.18mm devices and slip-free results up to 1100°C at a rate of 100°C/sec.Documents
No documents