Description
Reticle InspectionConfiguration
No ConfigurationOEM Model Description
KLA-Tencor Corp. has introduced two new enhancements for reticle and photomask inspection: the Advanced Performance Algorithm (APA) and the STARlight High Resolution (HR) option. These enhancements enable accurate and reliable inspection of next-generation 0.25-m reticles, including those with complex optical proximity correction (OPC) geometries. APA is a new feature for the RAPID 300 Series reticle pattern inspection systems, while HR is a new option for the STARlight reticle contamination inspection systems. The STARlight HR option uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production. STARlight HR is available on all SL300, SL301, and SL351 systems as a factory or field upgrade option.Documents
No documents
KLA
SL300
CATEGORY
Reticle / Mask Inspection
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
135550
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Reticle InspectionConfiguration
No ConfigurationOEM Model Description
KLA-Tencor Corp. has introduced two new enhancements for reticle and photomask inspection: the Advanced Performance Algorithm (APA) and the STARlight High Resolution (HR) option. These enhancements enable accurate and reliable inspection of next-generation 0.25-m reticles, including those with complex optical proximity correction (OPC) geometries. APA is a new feature for the RAPID 300 Series reticle pattern inspection systems, while HR is a new option for the STARlight reticle contamination inspection systems. The STARlight HR option uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production. STARlight HR is available on all SL300, SL301, and SL351 systems as a factory or field upgrade option.Documents
No documents