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APPLIED MATERIALS (AMAT) ARIS-i
    Description
    Tool will be configured for manual mask loading 5” 6” or 7” Optics magnifications M0 to M4 available Scanner Module Includes Stage Optics Light Source Lamp housing Camera Focus Laser Interferometer Mask handling assemblies IP Module: Detector Boards Database Express Data Express module: Pre Station
    Configuration
    No Configuration
    OEM Model Description
    ARIS-i™ is an advanced reticle inspection system that uses Ultraviolet (UV) wavelengths to automatically inspect reticles used in device generations of 180 nm and below. It features dual image processing channels, a high-quality CCD camera, and a high-speed computing architecture to provide the highest throughput for handling advanced RET technologies such as PSM and OPC with sensitivity down to 150 nm. The system also includes a Data Express™ module for fast data conversion and rendering for die-to-database inspection, as well as a Line Width Error Detector (LWED) for detecting local and regional linewidth variations. With fast inspection setup, high reliability, and availability, ARIS-i™ is the tool of choice for mask makers and semiconductor manufacturers looking for the lowest cost of ownership.
    Documents

    No documents

    verified-listing-icon

    Verified

    CATEGORY
    Reticle / Mask Inspection

    Last Verified: 16 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    140567


    Wafer Sizes:

    Unknown


    Vintage:

    2000


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    APPLIED MATERIALS (AMAT) ARIS-i

    APPLIED MATERIALS (AMAT)

    ARIS-i

    Reticle / Mask Inspection
    Vintage: 2000Condition: Used
    Last Verified16 days ago

    APPLIED MATERIALS (AMAT)

    ARIS-i

    verified-listing-icon
    Verified
    CATEGORY
    Reticle / Mask Inspection
    Last Verified: 16 days ago
    listing-photo-ad31a80f776843949372d53871bde2ea-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    140567


    Wafer Sizes:

    Unknown


    Vintage:

    2000


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Tool will be configured for manual mask loading 5” 6” or 7” Optics magnifications M0 to M4 available Scanner Module Includes Stage Optics Light Source Lamp housing Camera Focus Laser Interferometer Mask handling assemblies IP Module: Detector Boards Database Express Data Express module: Pre Station
    Configuration
    No Configuration
    OEM Model Description
    ARIS-i™ is an advanced reticle inspection system that uses Ultraviolet (UV) wavelengths to automatically inspect reticles used in device generations of 180 nm and below. It features dual image processing channels, a high-quality CCD camera, and a high-speed computing architecture to provide the highest throughput for handling advanced RET technologies such as PSM and OPC with sensitivity down to 150 nm. The system also includes a Data Express™ module for fast data conversion and rendering for die-to-database inspection, as well as a Line Width Error Detector (LWED) for detecting local and regional linewidth variations. With fast inspection setup, high reliability, and availability, ARIS-i™ is the tool of choice for mask makers and semiconductor manufacturers looking for the lowest cost of ownership.
    Documents

    No documents

    Similar Listings
    View All
    APPLIED MATERIALS (AMAT) ARIS-i

    APPLIED MATERIALS (AMAT)

    ARIS-i

    Reticle / Mask InspectionVintage: 2000Condition: UsedLast Verified:16 days ago