Semiconductors control a host of functions in electronic equipment. Nikon offers a stellar lineup of cutting-edge lithography systems that support precision circuit design down to the nanometer level.

NIKON

NRC-504

ARIS-i™ is an advanced reticle inspection system that uses Ultraviolet (UV) wavelengths to automatically inspect reticles used in device generations of 180 nm and below. It features dual image processing channels, a high-quality CCD camera, and a high-speed computing architecture to provide the highest throughput for handling advanced RET technologies such as PSM and OPC with sensitivity down to 150 nm. The system also includes a Data Express™ module for fast data conversion and rendering for die-to-database inspection, as well as a Line Width Error Detector (LWED) for detecting local and regional linewidth variations. With fast inspection setup, high reliability, and availability, ARIS-i™ is the tool of choice for mask makers and semiconductor manufacturers looking for the lowest cost of ownership.

Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

Reticle

Overview

Services

Manufacturers of Reticle

Top Products for Reticle

NRC-504

ARIS-i

MI-5080

DS-720