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KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
  • KLA RS100
Description
Omnimap Resistivity Mapping System
Configuration
No Configuration
OEM Model Description
The RS-100 is a production-worthy resistivity measurement system used in nearly all fabs worldwide. It provides advanced automation and improved edge performance for 300mm wafers. It has accurate and repeatable resistivity measurements up to 1mm from the conductive film edge, patented temperature compensation, and easy-to-use software. It is used in metal deposition, CMP, ion implantation, and diffusion. Its enhanced edge performance provides greater insight into process control variance and lowers cost-of-ownership.
Documents

No documents

verified-listing-icon

Verified

CATEGORY
Resistivity / Four Point Probe

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

82527


Wafer Sizes:

Unknown


Vintage:

2000


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

RS100

verified-listing-icon
Verified
CATEGORY
Resistivity / Four Point Probe
Last Verified: Over 60 days ago
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Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

82527


Wafer Sizes:

Unknown


Vintage:

2000


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Omnimap Resistivity Mapping System
Configuration
No Configuration
OEM Model Description
The RS-100 is a production-worthy resistivity measurement system used in nearly all fabs worldwide. It provides advanced automation and improved edge performance for 300mm wafers. It has accurate and repeatable resistivity measurements up to 1mm from the conductive film edge, patented temperature compensation, and easy-to-use software. It is used in metal deposition, CMP, ion implantation, and diffusion. Its enhanced edge performance provides greater insight into process control variance and lowers cost-of-ownership.
Documents

No documents