Description
PVD (Physical Vapor Deposition) Asset HDD not included Multi-Chamber Sputtering System ENTRON-EX W300T Triple Gun Cathode ToolConfiguration
Software Version: Ver. 332-A2 System Power Rating: 3 Phase,AC200V,80A/102A/63A 50/60 Hz Loading Configuration: 3 Load Ports Chm Position F1 PVD Sputter ( 3C ) AR, N2 Chm Position F2 PVD Sputter ( 3C ) AR, N2 Chm Position F4 PVD Sputter ( 3C ) AR, N2 Chm Position B1/B2 Degas Chambers F1,F2,F4 - PVD Chambers ( 3C Sputter process ) B1/B2 - Degas Chambers (Remove moist layer ) System is not configured with substrate bias. System utilizes AE MDX 1KOEM Model Description
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ULVAC
ENTRON-EX W300
Verified
CATEGORY
Deposition
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
48141
Wafer Sizes:
12"/300mm
Vintage:
2011
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Logistics Support
Available
Money Back Guarantee
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Transaction Insured by Moov
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Refurbishment Services
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View AllULVAC
ENTRON-EX W300
Verified
CATEGORY
Deposition
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
48141
Wafer Sizes:
12"/300mm
Vintage:
2011
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
PVD (Physical Vapor Deposition) Asset HDD not included Multi-Chamber Sputtering System ENTRON-EX W300T Triple Gun Cathode ToolConfiguration
Software Version: Ver. 332-A2 System Power Rating: 3 Phase,AC200V,80A/102A/63A 50/60 Hz Loading Configuration: 3 Load Ports Chm Position F1 PVD Sputter ( 3C ) AR, N2 Chm Position F2 PVD Sputter ( 3C ) AR, N2 Chm Position F4 PVD Sputter ( 3C ) AR, N2 Chm Position B1/B2 Degas Chambers F1,F2,F4 - PVD Chambers ( 3C Sputter process ) B1/B2 - Degas Chambers (Remove moist layer ) System is not configured with substrate bias. System utilizes AE MDX 1KOEM Model Description
None ProvidedDocuments
No documents