MOCVD
Last Verified:Over 60 days ago
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Last Verified:Over 60 days ago
Condition:Used
Operational Status:
Product ID:66553
Wafer Sizes:2"/50mm, 3"/75mm
Vintage:2000
This reactor is equipped for As/P material deposition. I think the previous user used it for GaAs deposition. Electrically it was performing OK, but now the front panel was turned off. We expect this to need a small fix, maybe something was unplugged, but the hardware should be OK. Lid cannot be opened now because we took the closed position sensors from the lid. Load lock can pump down but not backfill, probably a small issue.
In December 2021, the following functionality was proven: Heat-up to 600C Hydrogen flow Reactor pumpdown Not proven: MFC/valve functionality for process gas source lines
The AIXTRON G3 is a commercial MOCVD (Metal-Organic Chemical Vapor Deposition) system featuring a planetary cold-wall reactor design. This system exhibits an abrupt temperature gradient near the substrate, with the highest temperature at the substrate and a rapid decrease along the surface normal direction. This controlled temperature profile ensures precise and efficient epitaxial growth of compound semiconductor materials, making it suitable for various applications, including the production of optoelectronic devices like LEDs and laser diodes.
Last Verified:Over 60 days ago
Condition:Used
Operational Status:
Product ID:66553
Wafer Sizes:2"/50mm, 3"/75mm
Vintage:2000
This reactor is equipped for As/P material deposition. I think the previous user used it for GaAs deposition. Electrically it was performing OK, but now the front panel was turned off. We expect this to need a small fix, maybe something was unplugged, but the hardware should be OK. Lid cannot be opened now because we took the closed position sensors from the lid. Load lock can pump down but not backfill, probably a small issue.
In December 2021, the following functionality was proven: Heat-up to 600C Hydrogen flow Reactor pumpdown Not proven: MFC/valve functionality for process gas source lines
The AIXTRON G3 is a commercial MOCVD (Metal-Organic Chemical Vapor Deposition) system featuring a planetary cold-wall reactor design. This system exhibits an abrupt temperature gradient near the substrate, with the highest temperature at the substrate and a rapid decrease along the surface normal direction. This controlled temperature profile ensures precise and efficient epitaxial growth of compound semiconductor materials, making it suitable for various applications, including the production of optoelectronic devices like LEDs and laser diodes.
Moov goes beyond the transaction to ensure a seamless buying experience from start to finish.
Money Back Guarantee
Let Moov take the risk out of purchasing secondhand equipment with our 'No questions asked Money Back Guarantee' Learn more
Logistics
One stop shop for Moov-ing equipment anywhere globally.
Insurance
Moov-ing equipment can be risky. Let us take on that risk so you can relax while your equipment is in transit.
Refurbishment
Need a tool built to the required specifications? Moov's refurbishment team has over 20 years of experience.