Description

Shibaura PVD sputtering equipment Features ; • World's highest speed mass production sputtering technology for optical discs. • Supports mass production and continuous operation • Productivity improved by combination of upstream equipment and downstream equipment • Film characteristics dramatically better than with conventional methods (coating or evaporation) • Environmentally conscious design in terms of space saving and energy saving • Max Substrate size : diameter 250mm,. and its thiknes 2.0mm • Sputtering thickness 100nm(TiO2) 7nm (T-SiO2) 50nm (B-SiO2) Advantages of Equip : • Single-wafer load lock sputtering equipment • Supports wafers up to a maximum of eight inches • Five processing chambers (Sio2 : 2 layer, Tio2 : 2 layer ) • Inverse sputtering with our original cup gun method secures less damage • Heating unit included Application : • Hydrophilic Mirror Sputtering for automobile side mirror Sales Record • Hydrophilic Mirror Sputtering for automobile side mirror and DENSO’s Head Up display

Configuration

 Features ;  World's highest speed mass production sputtering technology for optical discs.  Film characteristics dramatically better than with conventional methods (coating or evaporation)  Environmentally conscious design in terms of space saving and energy saving  Max Substrate size : diameter 250mm,. and its thiknes 2.0mm  Application : Hydrophilic coating, sensors, MEMS application and thin coating applications.  It can used for R&D of surface modification and coatings solutions provider.  7 chambers : 1 Heating chamber, 6 processing chambers (Total 7 chamber) with Heating unit included.  Sputtering thickness 100nm(TiO2) 7nm (T-SiO2) 50nm (B-SiO2)  Technical Topics : refer to the web http://www.shibatec.com/products/vacuum/topics_01.html