
Description
Mostly used for NPI productsConfiguration
-Configured with 5 sputter heads -Configured for DC sputtering -Was used to deposit Cu, Au, Ti, Co, Ni, Pd, Pt, Ir, and Sn -Used with argon gas -Base pressure was 2 * 10^-7 Torr -No substrate heater -Substrate size is configured for 1” diameter wafers, but this can be changed as needed. The deposition platen is approximately 7” in diameter -Cathode target diameter is 3” -Included 3 DC power supplies and 1 RF supplyOEM Model Description
None ProvidedDocuments
No documents
CATEGORY
PVD / Sputtering
Last Verified: 7 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
143004
Wafer Sizes:
Unknown
Vintage:
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AJA INTERNATIONAL, INC
ATC-ORION 8
CATEGORY
PVD / Sputtering
Last Verified: 7 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
143004
Wafer Sizes:
Unknown
Vintage:
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Mostly used for NPI productsConfiguration
-Configured with 5 sputter heads -Configured for DC sputtering -Was used to deposit Cu, Au, Ti, Co, Ni, Pd, Pt, Ir, and Sn -Used with argon gas -Base pressure was 2 * 10^-7 Torr -No substrate heater -Substrate size is configured for 1” diameter wafers, but this can be changed as needed. The deposition platen is approximately 7” in diameter -Cathode target diameter is 3” -Included 3 DC power supplies and 1 RF supplyOEM Model Description
None ProvidedDocuments
No documents