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TEL / TOKYO ELECTRON TRIASe+ W
    Description
    MOCVD
    Configuration
    Triase+ SFD-W
    OEM Model Description
    Triase+™ W is a 300mm single-wafer CVD system that delivers high step coverage tungsten (W) film deposition using WF6. By combining rapid heat up and cool down of wafer temperatures and with plasma-less chamber cleaning technology, the system achieves higher productivity and lower CoO. Utilizing SFD and CVD methods respectively, the Triase+™ W provides in-situ deposition of both nucleation and bulk film. This ensures high step coverage, even with small geometry, contact holes. The system is also capable of depositing low-resistance film to meet further scaling needs, and is suitable for such applications as contact plug formation and via filling.
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    TEL / TOKYO ELECTRON

    TRIASe+ W

    verified-listing-icon

    Verified

    CATEGORY

    CVD (Metalization)
    Last Verified: Over 60 days ago
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    62724

    Wafer Sizes:

    12"/300mm

    Vintage:

    Unknown

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    TEL / TOKYO ELECTRON

    TRIASe+ W

    verified-listing-icon

    Verified

    CATEGORY

    CVD (Metalization)
    Last Verified: Over 60 days ago
    listing-photo-91f48ba1afa6449987f29f0701a707bd-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    62724

    Wafer Sizes:

    12"/300mm

    Vintage:

    Unknown

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    MOCVD
    Configuration
    Triase+ SFD-W
    OEM Model Description
    Triase+™ W is a 300mm single-wafer CVD system that delivers high step coverage tungsten (W) film deposition using WF6. By combining rapid heat up and cool down of wafer temperatures and with plasma-less chamber cleaning technology, the system achieves higher productivity and lower CoO. Utilizing SFD and CVD methods respectively, the Triase+™ W provides in-situ deposition of both nucleation and bulk film. This ensures high step coverage, even with small geometry, contact holes. The system is also capable of depositing low-resistance film to meet further scaling needs, and is suitable for such applications as contact plug formation and via filling.
    Documents

    No documents

    Similar Listings
    View All

    No Similar Listings