Skip to main content

INTEGRITY

Category
CVD
Overview

Integrity is a low pressure (LP) CVD system for depositing advanced interlevel dielectric films. This system utilizes a patented integrated process design for flowing gases rapidly over the wafer, forming films that are highly uniform and planar to provide improved electrical performance. Integrity has been installed at several customer sites and is currently being used for production of semiconductor devices and in device development programs.

Active Listings

0

Services

Inspection, Insurance, Appraisal, Logistics

Top Listings

    No products found
Have one like this?
List it with Moov and find the perfect buyer in no time at all.