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DSM 9800


DSM 9800 LP CVD system for depositing advanced pre-metal dielectric films. This system utilizes a patented integrated process design for flowing gases rapidly over the wafer, forming films that are highly uniform and planar at a lower thermal budget to provide improved device performance. DSM 9800 has been installed worldwide and is currently being used for production of semiconductor devices at 0.35 micron and beyond.

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