Description
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315-2604-002 RF GENERATOROEM Model Description
The Advanced Energy (AE) E-Wave bipolar pulsed DC power supply improves surface uniformity and reduces additive consumption for the copper-plating phase of dual-dam-ascene process flow (DDPF) application. The E-Wave power supply offers up to three channels, each of which independently driven bipolar power source and is capable of producing, storing, and running up to 15 current-controlled or voltage-controlled waveformsDocuments
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ADVANCED ENERGY
E-WAVE
Verified
CATEGORY
Power Supplies
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
61623
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
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Money Back Guarantee
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ADVANCED ENERGY
E-WAVE
CATEGORY
Power Supplies
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
61623
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
315-2604-002 RF GENERATOROEM Model Description
The Advanced Energy (AE) E-Wave bipolar pulsed DC power supply improves surface uniformity and reduces additive consumption for the copper-plating phase of dual-dam-ascene process flow (DDPF) application. The E-Wave power supply offers up to three channels, each of which independently driven bipolar power source and is capable of producing, storing, and running up to 15 current-controlled or voltage-controlled waveformsDocuments
No documents