The new Applied ALTA 4700DP system is part of a suite of powerful solutions offered for the fabrication and inspection of photomasks, including Sigmameltec™ resist-processing/cleaning products; Centura® Tetra™ EUV and optical mask etch systems; and the Applied Aera5™ Mask Inspection system. Advanced masks are 6-inches square (figure 1), but masks used for legacy wafer production include several other sizes and are mostly written by the large installed base of ALTA 3000-series laser writers

Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

ALTA 4700DP

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