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ULVAC CC-400
    Description
    Etchers
    Configuration
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    OEM Model Description
    The CC-400 is a load-lock-type plasma CVD system that is part of the CC-Series (CC-200/400). It is a compact and easy-to-use system designed for both R&D and production. The system supports high-density plasma processes on 27.12MHz and can deposit SiH4 (SiO2, SiNx, SiON, a-Si) and TEOS (SiO2). It also supports chamber cleaning by CF4+O2 plasma, heater for low-temperature deposition of organic EL, and various substrate sizes. The CC-400 has special features and further applications in compound-related devices of LED, LD, high-speed devices, organic EL systems for R&D use, solar battery systems for R&D use, and MEMS.
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    ULVAC

    CC-400

    verified-listing-icon

    Verified

    CATEGORY

    PECVD
    Last Verified: Over 30 days ago
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    101271

    Wafer Sizes:

    12"/300mm

    Vintage:

    2023

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    Similar Listings
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    ULVAC CC-400
    ULVACCC-400PECVD
    Vintage: 2023Condition: Used
    Last Verified9 days ago
    ULVAC CC-400
    ULVACCC-400PECVD
    Vintage: 2023Condition: Used
    Last VerifiedOver 30 days ago

    ULVAC

    CC-400

    verified-listing-icon

    Verified

    CATEGORY

    PECVD
    Last Verified: Over 30 days ago
    listing-photo-c073719ae2374d718eea47889619bb04-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75657/c073719ae2374d718eea47889619bb04/ea83df821e034dedb159e22d9a6fbdd5_2_mw.png
    listing-photo-c073719ae2374d718eea47889619bb04-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75657/c073719ae2374d718eea47889619bb04/9d86be50b69e464eafe3e1695c6afd9d_3_mw.png
    listing-photo-c073719ae2374d718eea47889619bb04-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75657/c073719ae2374d718eea47889619bb04/501078dbe4b94108801a91908a21d423_1_mw.png
    listing-photo-c073719ae2374d718eea47889619bb04-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75657/c073719ae2374d718eea47889619bb04/9c80e4418b4b42d695d683b4f4f21707_4_mw.png
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    101271

    Wafer Sizes:

    12"/300mm

    Vintage:

    2023

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Etchers
    Configuration
    No Configuration
    OEM Model Description
    The CC-400 is a load-lock-type plasma CVD system that is part of the CC-Series (CC-200/400). It is a compact and easy-to-use system designed for both R&D and production. The system supports high-density plasma processes on 27.12MHz and can deposit SiH4 (SiO2, SiNx, SiON, a-Si) and TEOS (SiO2). It also supports chamber cleaning by CF4+O2 plasma, heater for low-temperature deposition of organic EL, and various substrate sizes. The CC-400 has special features and further applications in compound-related devices of LED, LD, high-speed devices, organic EL systems for R&D use, solar battery systems for R&D use, and MEMS.
    Documents

    No documents

    Similar Listings
    View All
    ULVAC CC-400
    ULVAC
    CC-400
    PECVDVintage: 2023Condition: UsedLast Verified: 9 days ago
    ULVAC CC-400
    ULVAC
    CC-400
    PECVDVintage: 2023Condition: UsedLast Verified: Over 30 days ago